Thin films of iron oxide by low pressure MOCVD using a novel precursor: tris(t-butyl-3-oxo-butanoato)iron(III)
- 1 January 2003
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 424 (1), 56-60
- https://doi.org/10.1016/s0040-6090(02)00903-3
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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