Some Experiments Using a Vacuum-Cleaned Silicon p-n Junction
- 1 May 1961
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 32 (5), 848-855
- https://doi.org/10.1063/1.1736116
Abstract
Measurements of the junction characteristics and the transport properties on either side of a vacuum‐cleaned silicon p‐n junction have been carried out. The changes in these properties during the adsorption of oxygen and hydrogen have also been investigated. In the clean condition, the value of (EF−EV) for both 21.5 ohm‐cm n type and 27 ohm‐cm p type was found to be 0.13–0.14 ev. When the silicon surface was clean, a large excess current across the junction was observed which disappeared during the adsorption of gas.Keywords
This publication has 13 references indexed in Scilit:
- Surface Electrical Changes Caused by the Adsorption of Hydrogen and Oxygen on SiliconJournal of Applied Physics, 1961
- p Layers on Vacuum Heated SiliconJournal of Applied Physics, 1960
- Adsorption of Hydrogen on SiliconThe Journal of Chemical Physics, 1959
- Adsorption of Oxygen on SiliconThe Journal of Chemical Physics, 1959
- Work Function and Sorption Properties of Silicon CrystalsJournal of Applied Physics, 1958
- Calculation of the Space Charge, Electric Field, and Free Carrier Concentration at the Surface of a SemiconductorJournal of Applied Physics, 1955
- Ion Bombardment-Cleaning of Germanium and Titanium as Determined by Low-Energy Electron DiffractionJournal of Applied Physics, 1955
- Channels and Excess Reverse Current in Grown Germanium p-n Junction DiodesProceedings of the IRE, 1954
- Transistor Electronics: Imperfections, Unipolar and Analog TransistorsProceedings of the IRE, 1952
- The Photon Yield of Electron-Hole Pairs in GermaniumPhysical Review B, 1950