Epitaxial growth of Y thin films on (100)-SrTi
- 1 June 1988
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 37 (16), 9757-9760
- https://doi.org/10.1103/physrevb.37.9757
Abstract
He-ion channeling was applied to analyze the preparation of defect-free (100)-SrTi surfaces and the growth of large-area single-crystalline Y thin films. The analysis supported by Monte Carlo simulation revealed a strain-free growth with the axis perpendicular to the substrate surface in agreement with reflection high-energy electron diffraction technique measurements. The standard deviation of misoriented regions is 0.2°. The best minimum yield values of 12% are obtained for 1-MeV He ions. Energy-dependent yield measurements show that the films contain dislocations.
Keywords
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