Aluminum films deposited by rf sputtering
- 1 March 1970
- journal article
- Published by Springer Nature in Metallurgical Transactions
- Vol. 1 (3), 725-732
- https://doi.org/10.1007/bf02811600
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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- Determination of Stress in Films on Single Crystalline Silicon SubstratesReview of Scientific Instruments, 1965
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- Precise lattice constants of germanium, aluminum, gallium arsenide, uranium, sulphur, quartz and sapphireActa Crystallographica, 1962
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