Mechanism of Resist Pattern Collapse during Development Process
- 1 December 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (12S), 6059-6064
- https://doi.org/10.1143/jjap.32.6059
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Pattern replication accuracy in 1 : 1 SR lithographyMicroelectronic Engineering, 1993
- Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation LithographyJapanese Journal of Applied Physics, 1992
- Development of centrally controlled synchrotron radiation lithography beamline systemJournal of Vacuum Science & Technology B, 1990