Nanocomposite resists for electron beam nanolithography
- 31 August 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 56 (3-4), 289-294
- https://doi.org/10.1016/s0167-9317(01)00420-8
Abstract
No abstract availableKeywords
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- Resolution limits for electron-beam lithographyIBM Journal of Research and Development, 1988