Developments and trends in sputtering deposition techniques
- 1 February 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 32 (1), 19-25
- https://doi.org/10.1016/0040-6090(76)90546-0
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Backstreaming in diffusion pump systemsVacuum, 1974
- Re-emission of Sputtered SiO[2] During Growth and Its Relation to Film QualityIBM Journal of Research and Development, 1970
- Magnetic Field Effects on an Abnormal Truncated Glow Discharge and Their Relation to Sputtered Thin-Film GrowthJournal of Applied Physics, 1963