Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour deposition
- 27 September 1997
- journal article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 76 (3), 309-321
- https://doi.org/10.1080/01418639708241096
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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