Characterization of electromigration parameters in VLSI metallizations by 1/ƒ noise measurements
- 28 February 1991
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 34 (2), 185-188
- https://doi.org/10.1016/0038-1101(91)90087-f
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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