Low voltage ZnO varistor: Device process and defect model
- 1 January 1980
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 51 (1), 765-768
- https://doi.org/10.1063/1.327338
Abstract
A new process is described for achieving the current‐voltage characteristics of a ZnO varistor with a breakdown voltage less than 20 V. The structure has been made by using Ag contacts containing oxides of Bi and Pb which serve both as a diffusion source for grain and/or grain boundary doping, and as metallic contacts on polycrystalline ZnO substrate. The structure was also made by sputtering a layer of various metal oxides such as Bi2O3, Sb2O3, Co3O4, etc. and then evaporating contact metals. The device shows a nonlinear current‐voltage characteristic when annealed at 800–900 °C in air. Annealing in N2 ambient however, results in linear I‐V characteristics. The presence of certain critical additives such as Bi2O3 was found essential for the development of nonlinearity. Based on these observations and the known defect structure of pure ZnO, a defect model which takes into account the role of oxygen in developing the nonlinear behavior of the proposed device is presented.Keywords
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