The influence of adsorption energies on ion impact desorption of surface layers
- 31 December 1979
- journal article
- Published by Elsevier in Surface Science
- Vol. 89 (1-3), 710-717
- https://doi.org/10.1016/0039-6028(79)90650-2
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Mass and energy dependence of the equilibrium surface composition of sputtered tantalum oxideApplied Physics Letters, 1978
- A contribution to the investigation of ion impact desorption by ion scatteringApplied Physics A, 1977
- Sputtering of adsorbed layers by ion bombardmentJournal of Nuclear Materials, 1976
- An evaluation of heats of chemisorption of gases by an empirical methodSurface Science, 1976
- Sputtering of chemisorbed gas (nitrogen on tungsten) by low-energy ionsJournal of Applied Physics, 1974
- A Study of the Neutral Species rf Sputtered from Oxide TargetsJapanese Journal of Applied Physics, 1974
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- The adsorption of carbon monoxide on evaporated metal filmsPhilosophical Transactions of the Royal Society of London. Series A, Mathematical and Physical Sciences, 1965