PbTiO3ferroelectric thin film gate fet for infrared detection
- 1 June 1981
- journal article
- research article
- Published by Taylor & Francis in Ferroelectrics
- Vol. 33 (1), 235-241
- https://doi.org/10.1080/00150198108008091
Abstract
A field effect transistor with a PbTiO3 ferroelectric thin film gate has been prepared as an infrared sensor which works at room temperature and has an infrared sensitivity in a wide spectral range. PbTiO3 thin film was deposited with rf sputtering at substrate temperatures of 300–550°C. A dielectric constant of 200 and a maximum remanent polarization of 27 μC/cm2 were obtained in the films deposited on platinum foil. Pyroelectric response of the film on platinum-coated mica was obtained with a voltage responsivity Rv and detectivity D* of 330 V/W and 1.5 × 108 cm√Hz/W with a bandwidth of 1 Hz respectively at 20 Hz by using infrared light coming through a Ge filter from an incandescent lamp. This film was deposited on the gate of a Si MOSFET to control the surface potential on the current channel. This FET has also pyroelectric sensitivity with Rv and D* of 390 V/W and 3.5 × 105 cm √Hz/W with a bandwidth of 1 Hz respectively at 20 Hz. Fast response with a rise time of ∼3.5 μsec is obtained by measuring the output under CO2 laser pulse irradiation.Keywords
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