Stress measurement of CVD diamond films
- 1 May 1995
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 4 (5-6), 837-842
- https://doi.org/10.1016/0925-9635(94)05327-8
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Determination of diamond film quality during growth using in situ Raman spectroscopyDiamond and Related Materials, 1994
- Studies of stress related issues in microwave CVD diamond on 〈100〉 silicon substratesThin Solid Films, 1992
- Strain in CVD diamond films: effects of deposition variablesThin Solid Films, 1992
- Evaluation of internal stresses present in chemical vapor deposition diamond filmsSurface and Coatings Technology, 1991
- Intrinsic stress in diamond films prepared by microwave plasma CVDJournal of Applied Physics, 1991
- Measurement of crystalline strain and orientation in diamond films grown by chemical vapor depositionJournal of Materials Research, 1990
- Vapor deposition of diamond thin films on various substratesApplied Physics Letters, 1990
- Internal stress and elasticity of synthetic diamond filmsApplied Physics Letters, 1990
- Characterization of crystalline quality of diamond films by Raman spectroscopyApplied Physics Letters, 1989
- Characterization of diamond films by Raman spectroscopyJournal of Materials Research, 1989