Plasma anodization of silicon and its application to the fabrication of devices and integrated circuits
- 1 September 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 95 (4), 315-326
- https://doi.org/10.1016/0040-6090(82)90037-2
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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- Electrochemical Charging of Thermal SiO2 Films by Injected Electron CurrentsJournal of Applied Physics, 1971
- Silicon Oxidation in an Oxygen Plasma Excited by MicrowavesJournal of Applied Physics, 1965