Novel Technique of Infrared Reflection Absorption Spectroscopy for Si Surface Study
- 1 August 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (8B), L1176
- https://doi.org/10.1143/jjap.32.l1176
Abstract
It is demonstrated that Fourier-transform infrared reflection absorption spectroscopy with a novel arrangement is a powerful technique to study the nature of Si surfaces. The technique was applied to the observation of the Si-H bond absorption (2083 cm-1) on HF- or NH4F-treated Si(111) surfaces and the Si-O-Si bond absorption (1000-1300 cm-1) of oxides on the Si surface formed by native oxidation in air. Both absorptions were clearly observed.Keywords
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