Rapid thermal nitridation of SiO2 films
- 1 October 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 39 (1-4), 219-226
- https://doi.org/10.1016/0169-4332(89)90436-4
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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