Some fundamental aspects of glow discharges in plasma-assisted processes
- 31 December 1987
- journal article
- Published by Elsevier BV in Surface and Coatings Technology
- Vol. 33, 17-29
- https://doi.org/10.1016/0257-8972(87)90173-3
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
- Ion energy distributions in a special glow-discharge ion sourceVacuum, 1986
- Ion energy distribution in triode ion platingVacuum, 1984
- Energies of particles at the cathode of a glow dischargeVacuum, 1984
- The characteristics of the ion and neutral fluxes incident on the substrate in an ion plating dischargeVacuum, 1984
- Simple parallel plate energy analyser for measuring the energy distribution of metal vapours in a dischargeJournal of Physics E: Scientific Instruments, 1980
- Langmuir probe measurements in the negative glow of a sputtering DC dischargeJournal of Physics D: Applied Physics, 1978
- Low-voltage triode sputtering with a confined plasma. Part II: Plasma characteristics and energy transportJournal of Vacuum Science and Technology, 1975
- A glow discharge ion gun for etchingVacuum, 1973
- Cathode Dark-Space Measurements and Deposition Rates of Tantalum in a Sputtering SystemJournal of Applied Physics, 1972
- Ion Energies at the Cathode of a Glow DischargePhysical Review B, 1963