Laser annealing of zinc oxide thin film deposited by spray-CVD
- 1 March 1998
- journal article
- Published by Elsevier in Materials Science and Engineering B
- Vol. 52 (1), 25-31
- https://doi.org/10.1016/s0921-5107(97)00272-9
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Modified CVD growth and characterization of ZnO thin filmsMaterials Chemistry and Physics, 1993
- Characterisation of conducting SnO2layers deposited by modified spray pyrolysis techniqueMaterials Chemistry and Physics, 1988
- Synchrotron X-Ray Diffraction Study of Silicon during Pulsed-Laser AnnealingPhysical Review Letters, 1982
- Time-Resolved Optical Transmission and Reflectivity of Pulsed-Ruby-Laser Irradiated Crystalline SiliconPhysical Review Letters, 1982
- Measurement of the Velocity of the Crystal-Liquid Interface in Pulsed Laser Annealing of SiPhysical Review Letters, 1982
- A melting model for pulsing-laser annealing of implanted semiconductorsJournal of Applied Physics, 1979
- Physical and electrical properties of laser-annealed ion-implanted siliconApplied Physics Letters, 1978
- Laser annealing of boron-implanted siliconApplied Physics Letters, 1978