Amorphous boron films
- 29 February 1968
- journal article
- Published by Elsevier in Materials Research Bulletin
- Vol. 3 (2), 95-106
- https://doi.org/10.1016/0025-5408(68)90052-4
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- Dispersion of Amorphous Boron Films in the Near InfraredJournal of the Optical Society of America, 1967
- Negative resistance in cadmium sulphide filmsBritish Journal of Applied Physics, 1967
- An Electron Diffraction Study Evaporated Boron FilmsJapanese Journal of Applied Physics, 1966
- Avalanche-Induced Negative Resistance in Thin Oxide FilmsJournal of Applied Physics, 1965
- POST-BREAKDOWN CONDUCTION IN FORWARD-BIASED P-I-N SILICON DIODESApplied Physics Letters, 1964
- Electrical Properties of Amorphous SemiconductorsReviews of Modern Physics, 1964
- Potential Distribution and Negative Resistance in Thin Oxide FilmsJournal of Applied Physics, 1964
- Avalanche Breakdown-Double Injection Induced Negative Resistance in SemiconductorsJournal of the Physics Society Japan, 1962
- Uniform Silicon p-n Junctions. II. Ionization Rates for ElectronsJournal of Applied Physics, 1960
- The Breakdown Effect in Boron ConductorsPhysical Review B, 1918