Impurity-induced disordering of single well AlxGa1−xAs-GaAs quantum well heterostructures

Abstract
Transmission electron microscopy and photoluminescence data are used to show that a single GaAs quantum well (Lz ≊70 Å) confined by AlxGa1−xAs (x′∼0.3) layers can, via low‐temperature (600 °C) Zn diffusion, be interdiffused (‘‘absorbed’’) into the confining layers (impurity‐assisted Al‐Ga interdiffusion) and be shifted to higher gap (x=0→x′∼0.3) without damaging the crystal or ruining its capability to operate as a continuous 300‐K low threshold photopumped laser.