A new model for the deposition of ω-tricosenoic acid Langmuir-Blodgett film layers
- 1 November 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 109 (4), 371-378
- https://doi.org/10.1016/0040-6090(83)90190-6
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- Electron beam resists produced from monomer-polymer Langmuir-Blodgett filmsThin Solid Films, 1983
- Letters to the EditorNew Zealand Veterinary Journal, 1982
- A high-current, high speed electron beam lithography columnJournal of Vacuum Science and Technology, 1981
- Model of the dissolution of monomolecular photoresistsThin Solid Films, 1981
- Polymerized monomolecular layers: A new class of ultrathin resins for microlithographyThin Solid Films, 1980
- Defect density in a metal-monolayer-metal cellAustralian Journal of Chemistry, 1980
- PMMA copolymers as high sensitivity electron resistsJournal of Vacuum Science and Technology, 1979
- Negative electron resists for direct fabrication of devicesJournal of Vacuum Science and Technology, 1978
- Solid-state electron-induced polymerization of ω-tricosenoic acid multilayersJournal of Colloid and Interface Science, 1977
- Built-Up Films of Barium Stearate and Their Optical PropertiesPhysical Review B, 1937