Ultraviolet-ozone jet cleaning process of organic surface contamination layers

Abstract

To understand the ultraviolet (UV)-ozone jet cleaning process of organic surface contamination layers, adventitious hydrocarbon layers on Si, self-assembled octadecyltrichlorosilane monolayers on Si, and self-assembled ${\mathrm{C}}_{60}{\mathrm{H–(CH}}_{\mathrm{2}}{\mathrm{)}}_{\mathrm{12}}\mathrm{–SH}$ monolayers on Au were cleaned with pure ozone jet and UV irradiation. Cleaned surfaces were analyzed with in situ x-ray photoelectron spectroscopy measurements. Ozone molecules could react with the unsaturated C–C bonds in self-assembled ${\mathrm{C}}_{\mathrm{60}}{\mathrm{H–(CH}}_{\mathrm{2}}{\mathrm{)}}_{\mathrm{12}}\mathrm{–SH}$ monolayers on Au surfaces at room temperature. However, the saturated C–C bonds in OTS hydrocarbon molecules adsorbed on Au surfaces reacted not with ozone molecules but with oxygen radicals generated by the dissociation of ozone molecules under UV irradiation. For adventitious carbon contamination on Si surfaces, only a fraction could be cleaned by ozone at room temperature but it could be almost cleaned with UV-ozone jet.