Ozone cleaning of the Si-SiO2 system
- 1 July 1987
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 43 (3), 223-226
- https://doi.org/10.1007/bf00615981
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Advanced Techniques to Decrease Defect Density in Molecular Beam Epitaxial Silicon FilmsJapanese Journal of Applied Physics, 1985
- UV ozone cleaning of silicon substrates in silicon molecular beam epitaxyApplied Physics Letters, 1984