Simulations of submicron-scale erosion and ripple formation on ion bombarded solid surfaces
- 1 August 1996
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 117 (1-2), 95-100
- https://doi.org/10.1016/0168-583x(96)00230-3
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- Anisotropic Kuramoto-Sivashinsky Equation for Surface Growth and ErosionPhysical Review Letters, 1995
- Modeling ion bombardment induced submicron-scale surface rougheningNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
- Dynamic Scaling of Ion-Sputtered SurfacesPhysical Review Letters, 1995
- Scanning tunneling microscopy observation of self-affine fractal roughness in ion-bombarded film surfacesPhysical Review Letters, 1993
- Universality in surface growth: Scaling functions and amplitude ratiosPhysical Review A, 1992
- Submicron-scale surface roughening induced by ion bombardmentPhysical Review Letters, 1991
- Theory of ripple topography induced by ion bombardmentJournal of Vacuum Science & Technology A, 1988
- Dynamic Scaling of Growing InterfacesPhysical Review Letters, 1986
- Nuclear stopping in polycrystalline materials: Range distributions and Doppler-shift attenuation analysisPhysical Review B, 1984
- The mechanisms of etch pit and ripple structure formation on ion bombarded Si and other amorphous solidsNuclear Instruments and Methods, 1980