Epitaxial PbTiO3 thin films grown by organometallic chemical vapor deposition
- 10 June 1991
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 58 (23), 2636-2638
- https://doi.org/10.1063/1.104792
Abstract
Epitaxial PbTiO3 layers have been grown on (001)SrTiO3 substrates by organometallic chemical vapor deposition using the precursors titanium‐iso‐propoxide and tetra‐ethyl‐lead. The growth temperature for these films was around 700 °C. The epitaxial nature of c‐axis‐oriented PbTiO3 is confirmed by Rutherford backscattering spectrometry, x‐ray diffraction, including pole figure analysis, and high‐resolution electron microscopy (HREM). With HREM twinning has been observed.Keywords
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