Growth of CuInSe2 by molecular beam epitaxy
- 1 October 1980
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 51 (10), 5464-5469
- https://doi.org/10.1063/1.327504
Abstract
We have used molecular beam epitaxy to grow CuInSe2 layers on CdS (0001B) and other substrates. Epitaxial growth is obtained at a substrate temperature of 300 °C. The ratio of the arrival rates of copper to indium is the key parameter governing layer stoichiometry. In order to produce low‐resistivity p‐type layers, the Cu/In arrival rate ratio must be slightly higher than that used to grow nominally stoichiometric layers. This suggests that a different defect is controlling electrical properties, rather than the copper vacancy complex which dominates bulk material. We have fabricated CuInSe2/CdS heterojunctions which show a maximum solar conversion efficiency of ∼5%.Keywords
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