Boron Redistribution During Transient Thermal Metal Silicide Growth on Si
- 1 January 1984
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Simultaneous boron and hydrogen profiling in gas-phase-doped hydrogenated amorphous siliconThin Solid Films, 1983
- Low energy range distributions of 10B and 11B in amorphous and crystalline siliconNuclear Instruments and Methods in Physics Research, 1982
- Treatise on Solid State Chemistry Vol. 1: The Chemical Structure of SolidsPhysics Today, 1975