Self-Aligned Gate Metallization Processes with Low-Thermal Budget
- 1 January 1998
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Analysis of resistance behavior in Ti- and Ni-salicided polysilicon filmsIEEE Transactions on Electron Devices, 1994