Growth of a-Si:H Films by Remote Plasma Enhanced CVD (RPECVD)

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1 January 1988

journal article
Published by Springer Nature in MRS Proceedings

Vol. 118
https://doi.org/10.1557/proc-118-37

Abstract

No abstract available

Keywords

This publication has 5 references indexed in Scilit:

Glow-discharge amorphous silicon: Growth process and structure
Materials Science Reports, 1987
Deposition of silicon oxynitride thin films by remote plasma enhanced chemical vapor deposition
Journal of Vacuum Science & Technology A, 1987
Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition
Physical Review B, 1986
Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon
Thin Solid Films, 1982
High-pressure helium afterglow at room temperature
Physical Review A, 1976

Cited by 4 articles