A capacitively coupled microplasma (CCµP) formed in a channel in a quartz wafer

Abstract

An optical emission plasma source with dimensions as small as 0.25 × 0.25 × 5 mm has been implemented on a quartz wafer. The He plasma, formed using a parallel plate, capacitively coupled geometry, operates at atmospheric pressure, uses a 13.56 MHz power source at 5–25 W, with gas flows between 17–150 mL min⁻¹, and is self-igniting. Parallel-plate capacitive power coupling is nearly ideal for generating and sustaining a plasma discharge “on a chip” since it can be implemented using a very simple electrode structure and does not require tuned or resonant structures.