Fluorine doping of IN2O3 films employing ion-plating techniques
- 1 June 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 80 (1-3), 63-66
- https://doi.org/10.1016/0040-6090(81)90207-8
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Composition and conductivity of fluorine-doped conducting indium oxide films prepared by reactive ion platingThin Solid Films, 1981
- Reactive ion plating of metal oxides onto insulating substratesThin Solid Films, 1979
- Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its CompoundsIBM Journal of Research and Development, 1979
- Effects of heat treatment on the optical and electrical properties of indium–tin oxide filmsJournal of Applied Physics, 1978
- Anomalous Optical Absorption Limit in InSbPhysical Review B, 1954