Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays
- 1 May 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (3), 729-735
- https://doi.org/10.1116/1.589377
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Fabrication of sub-0.5 μm diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm×50 cm glass substrates using laser interference lithographJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Magnetic force microscopy of single-domain cobalt dots patterned using interference lithographyIEEE Transactions on Magnetics, 1996
- Optically matched trilevel resist process for nanostructure fabricationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Field emitter array mask patterning using laser interference lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- High-efficiency metallic diffraction gratings for laser applicationsApplied Optics, 1995
- In situ end-point detection during development of submicrometer grating structures in photoresistOptical Engineering, 1995
- Extreme-ultraviolet polarization and filtering with gold transmission gratingsApplied Optics, 1995
- Resistivity profile measurements of proton-irradiated n-type siliconSolid-State Electronics, 1994
- Understanding focus effects in submicrometer optical lithography: a reviewOptical Engineering, 1993