Reaction of fluorine atoms with SiO2
- 1 October 1979
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (10), 6211-6213
- https://doi.org/10.1063/1.325755
Abstract
The heterogeneous reaction of F atoms with SiO2 (thermal oxide) has been measured using a discharge‐flow tube technique. The reaction probability for F atoms is εF= (1.63±0.15) ×10−2 exp(−0.163 eV/kT) for 250<T<365 K.Keywords
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