Thermally stimulated defect removal in hydrogenated amorphous silicon thin film transistors
- 1 December 1993
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 164-166, 199-202
- https://doi.org/10.1016/0022-3093(93)90525-3
Abstract
No abstract availableKeywords
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