Linearly extended plasma source for large-scale applications
- 1 September 1999
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 116-119, 552-557
- https://doi.org/10.1016/s0257-8972(99)00283-2
Abstract
No abstract availableKeywords
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- Reactive ion etching of silicon using bromine containing plasmasJournal of Vacuum Science & Technology A, 1990
- Elongated microwave electron cyclotron resonance heating plasma sourceJournal of Vacuum Science & Technology A, 1990
- A broad-beam electron cyclotron resonance ion source for sputtering etching and deposition of materialJournal of Vacuum Science & Technology A, 1989