Structural characterization of transparent semiconducting thin films of SnO2 and In2O3
- 1 November 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 85 (3-4), 355-359
- https://doi.org/10.1016/0040-6090(81)90149-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Plasma etching of SnO2 films on silicon substratesThin Solid Films, 1980
- Étude par diffraction de rayons X de films à base d'oxydes d'étain et d'indiumThin Solid Films, 1973