U.S. Navy manufacturing technology program on ion implantation
- 30 June 1987
- journal article
- Published by Elsevier in Materials Science and Engineering
- Vol. 90, 385-397
- https://doi.org/10.1016/0025-5416(87)90236-9
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- In situ auger electron spectroscopy applied to the study of chemisorption and diffusion during reactive implantation of titanium into ironApplied Surface Science, 1986
- IMPLNT — A fortran program to calculate the distribution of implanted ions which includes the effects due to sputteringNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- In situ auger analysis of surface composition during high fluence ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Manufacturing technology program to develop a production ion implantation facility for processing bearings and toolsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- A high throughput metal ion implanter end stationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Carburization of steel surfaces during implantation of Ti ions at high fluencesJournal of Vacuum Science & Technology A, 1983
- A method for determining depth profiles of transition elements in steelsNuclear Instruments and Methods, 1980
- Depth distribution of energy deposition by ion bombardmentComputer Physics Communications, 1974
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969