Micro-grid fabrication of fluorinated polyimide by using magnetically controlled reactive ion etching (MC-RIE)
- 30 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- Vol. 40, 59-64
- https://doi.org/10.1109/memsys.1993.296952
Abstract
A micro grid consisting of 100- mu m-high pole-shaped counterelectrode elements arranged like a pair of interleaved combs was fabricated using a fluorinated polyimide as structural material and metallization and lift-off using a ZnO sacrificial layer. Research into the magnetically controlled reactive ion etching (MC-RIE) of fluorinated polyimide substrate has resulted in an etching selectivity of up to 2600. These conditions result in a smooth etched surface. Shaped constructions hundreds of micrometers high with a good perpendicular shape can be formed using the MC-RIE technique for fluorinated polyimide micro-fabrication. Moreover, many kinds of 3-D structural devices can be manufactured when this technology is combined to a lift-off method using a ZnO sacrificial layer.<>Keywords
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