Kinetic aspects of plasma etching of polyimide in CF4 O2 discharges
- 31 December 1990
- journal article
- Published by Elsevier in Polymer Degradation and Stability
- Vol. 27 (2), 169-181
- https://doi.org/10.1016/0141-3910(90)90107-i
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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