Diffusion and Solubility of Zinc in Gallium Phosphide Single Crystals
- 1 February 1964
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 35 (2), 374-378
- https://doi.org/10.1063/1.1713321
Abstract
Radiotracer Zn65 has been diffused into 0.2‐Ω cm sulfur‐doped GaP single crystals from constant pressure vapor sources. Solid solubilities have been measured at temperatures between 800° and 1100°C, the diffusion profiles have been obtained and these have been analyzed by the Matano method. Although retrograde solid solubility is expected at higher temperatures, the data below 1100°C are an excellent fit to the relation C=2.6×1023 exp(−0.85/kT). The diffusion coefficient is found to be concentration‐dependent. At temperatures below 900°C the diffusion coefficient can be represented by the empirical expression D=7.5×10−8 C0.45 exp(−2.50/kT). Above 900°C the profiles are similar to those of Zn in GaAs and the diffusion coefficient varies approximately as the square of the zinc concentration. The results are interpreted and the diffusion mechanism is discussed in terms of parallel‐mode diffusion of interstitial and substitutional zinc.Keywords
This publication has 8 references indexed in Scilit:
- Solubility and Diffusion of Zinc in Gallium PhosphideJournal of Applied Physics, 1963
- Indium antimonide—A review of its preparation, properties and device applicationsSolid-State Electronics, 1962
- Rapid zinc diffusion in gallium arsenideSolid-State Electronics, 1962
- Vapor Phase Preparation of Gallium Phosphide CrystalsJournal of the Electrochemical Society, 1961
- The Preparation and Floating Zone Processing of Gallium PhosphideJournal of the Electrochemical Society, 1961
- Diffusion of zinc in gallium arsenideJournal of Physics and Chemistry of Solids, 1960
- Mobility of Impurity Ions in Germanium and SiliconPhysical Review B, 1953
- Equalibrium Thermochemistry of Solid and Liquid Alloys of Germanium and of Silicon. II. The Retrograde Solid Solubilities of Sb in Ge, Cu in Ge and Cu in SiThe Journal of Physical Chemistry, 1953