SITE TRANSFER OF Si IN GaAs

Abstract
Experimental evidence is presented which (1) allows quantitative determination of the redistribution of Si impurities between Ga and As sites after Li diffusion; (2) shows there is no loss of Si to complex or pair formation when NSi ∼ 1−2 × 1018 cm−3; and (3) indicates that the site symmetry of the Si is tetrahedral before and after redistribution.