Silica and Alumina Thin Films Grown by Liquid Phase Deposition
- 15 January 2005
- journal article
- Published by Trans Tech Publications, Ltd. in Materials Science Forum
- Vol. 475-479, 1725-1728
- https://doi.org/10.4028/www.scientific.net/msf.475-479.1725
Abstract
This work demonstrates the condition optimization during liquid phase deposition (LPD) of SiO2/GaAs films. LPD method is further applied to form Al2O3 films on semiconductors with poison-free materials. Proceeding at room temperature with inexpensive equipment, LPD of silica and alumina films is potentially serviceable in microelectronics and related spheres.Keywords
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