X-Ray Topography with Chromatic-Aberration Correction
- 1 November 1971
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 42 (12), 4731-4735
- https://doi.org/10.1063/1.1659847
Abstract
A new scanning topographic technique has been devised to superimpose images due to x rays with different wavelengths. This method is named ``chromatic‐aberration‐correction'' (CAC) topography and provides the following advantages in comparison with the usual scanning topography with only Kα1 radiations: (i) A high resolution is obtained even with both the Kα1 and Kα2 radiations. The effect of the CAC technique on resolution is remarkable for higher‐order reflections for which high‐resolution topographs are not obtained easily by the usual technique. (ii) The exposure time is reduced to ⅔ by using both Kα1 and Kα2 radiations. (iii) Uniform topographs of warped crystals such as semiconductor devices can be obtained with a high resolution by the combination of the CAC recording and a simple crystal‐orientation‐tuning device. These advantages are demonstrated by some observations of Si wafers.Keywords
This publication has 6 references indexed in Scilit:
- X-Ray Diffraction Topography Utilizing Double-Crystal Arrangement of (+, +) or Non-Parallel (+, -) SettingJapanese Journal of Applied Physics, 1970
- A New Method of X-Ray Diffraction Topography Using Monochromatic Divergent Beams Made by a Curved CrystalJapanese Journal of Applied Physics, 1968
- The Kα2 Radiation Monochromated by a New Filter and Its Topographical and Other ApplicationsJapanese Journal of Applied Physics, 1968
- New X-Ray Diffraction Microscopy Technique for the Study of Imperfections in Semiconductor CrystalsJournal of Applied Physics, 1965
- Studies of Individual Dislocations in Crystals by X-Ray Diffraction MicroradiographyJournal of Applied Physics, 1959
- The projection topograph: a new method in X-ray diffraction microradiographyActa Crystallographica, 1959