Ionized-cluster beam epitaxy
- 1 December 1978
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 45, 318-325
- https://doi.org/10.1016/0022-0248(78)90456-6
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Ionized-cluster beam epitaxyJournal of Crystal Growth, 1978
- Ionized-cluster beam deposition and epitaxy as fabrication techniques for electron devicesThin Solid Films, 1977
- Thin-film deposition using low-energy ion beams (2) Bb+ ion-beam deposition and analysis of depositsJournal of Vacuum Science and Technology, 1977
- An evaluation of metal and semiconductor films formed by ionized-cluster beam depositionThin Solid Films, 1976
- Effect of ion irradiation on the formation, structure and properties of thin metal filmsThin Solid Films, 1976
- Ionized-cluster beam depositionJournal of Vacuum Science and Technology, 1975
- Oxidation of lead by low energy O2+ bombardmentSurface Science, 1972
- Ion-Beam Deposition of Thin Films of Diamondlike CarbonJournal of Applied Physics, 1971
- A low-energy ion source for the deposition of chromiumJournal of Physics D: Applied Physics, 1968