The reaction of fluorine atoms with silicon
- 1 May 1981
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 52 (5), 3633-3639
- https://doi.org/10.1063/1.329098
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Etching Silicon with Fluorine GasJournal of the Electrochemical Society, 1979
- Reaction of fluorine atoms with SiO2Journal of Applied Physics, 1979
- The plasma oxidation of CF4 in a tubular-alumina fast-flow reactorJournal of Applied Physics, 1979
- Infrared Chemiluminescence from Xe-Silicon-Surface ReactionsPhysical Review Letters, 1979
- Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmasJournal of Applied Physics, 1978
- The adsorption of CO on planar and oxygen-etched silicon surfacesSurface Science, 1978
- Theory of Atomic Recombination on SurfacesThe Journal of Chemical Physics, 1971
- Chemisorption and incorporation of oxygen at a nickel surfaceProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1967
- Silicon-Fluorine Chemistry. I. Silicon Difluoride and the Perfluorosilanes1Journal of the American Chemical Society, 1965
- Kinetics of Reaction of Elemental Fluorine. III. Fluorination of Silicon and Boron1The Journal of Physical Chemistry, 1964