Amorphous aluminum silicate films by metal-organic chemical vapor deposition using aluminum-tri-sec-butoxide and tetraethyl orthosilicate
- 1 August 2003
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 324 (1-2), 159-171
- https://doi.org/10.1016/s0022-3093(02)01597-1
Abstract
No abstract availableKeywords
This publication has 33 references indexed in Scilit:
- Mullite Coatings on SiC and C/C–Si–SiC Substrates Characterized by Infrared SpectroscopyJournal of the American Ceramic Society, 1997
- Characterization of Si3N4 Coated with Chemically‐Vapor‐Deposited Mullite after Na2SO4‐lnduced CorrosionJournal of the American Ceramic Society, 1996
- Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Films Using Tetraethoxysilane and Oxygen: Characterization and Properties of FilmsJournal of the Electrochemical Society, 1992
- An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experimentsJournal of Materials Research, 1992
- Stress in SiO2 Films Deposited by Plasma and Ozone Tetraethylorthosilicate Chemical Vapor Deposition ProcessesJournal of the Electrochemical Society, 1992
- Aluminum oxide thin films prepared by chemical vapor deposition from aluminum acetylacetonateApplied Physics Letters, 1992
- Effects of Various Atmospheres on the Reduced‐Pressure CVD of Al2 O 3 Thin Films at Low TemperaturesJournal of the Electrochemical Society, 1989
- The effects of reaction parameters on the deposition characteristics in Al2O3 CVDJournal of Vacuum Science & Technology A, 1983
- Properties of Al2 O 3 Films Deposited from the AlCl3, CO 2, and H 2 SystemJournal of the Electrochemical Society, 1978
- Deposition of New Binary Oxide Thin Films by the Pyrolytic Decomposition of Trimethylsiloxy-Aluminum-lsopropoxide (Me[sub 3]SiO)[sub n]Al(O[sup i]Pr)[sub 3−n]Journal of the Electrochemical Society, 1968