Anisotropic dry etching of GaAs and silicon using CCl4
- 1 December 1985
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 3 (1-4), 435-442
- https://doi.org/10.1016/0167-9317(85)90054-1
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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