Abstract
A new type of field-effect transistor (SD-DH-FET) has been successfully fabricated in which very-high-density electrons (∼1.27×1012/cm2) are supplied from a selectively-doped (AlGa)As/GaAs/(AlGa)As double-heterojunction structure grown by molecular beam epitaxy. The structure showed an extremely high sheet conductivity of 24 mS/□ at 77 K with a Hall mobility of 119,000 cm2/Vs. A depletion-mode FET with this structure showed high channel mobility of more than 35,000 cm2/Vs at 77 K, suggesting that SD-DH-FETs have potential for applications to extremely high-speed microwave devices and integrated circuits.