Effect of Ambient Atmosphere on Thin Film Reaction of Si3N4 with Ti
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Interaction of Titanium with Silica After Rapid Thermal Annealing in Argon, Nitrogen, and OxygenJournal of the American Ceramic Society, 1989
- Brazing of Titanium-Vapor-Coated Silicon NitrideAdvanced Ceramic Materials, 1988
- Thin-film reaction between Ti and Si3N4Applied Physics Letters, 1987
- Reaction of titanium with silicon nitride under rapid thermal annealingApplied Physics Letters, 1986
- Phase equilibria in thin-film metallizationsJournal of Vacuum Science & Technology B, 1984