Compositionally induced valence-band offset at the grain boundary of polycrystalline chalcopyrites creates a hole barrier
- 15 November 2005
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 87 (21), 211904
- https://doi.org/10.1063/1.2132537
Abstract
First-principles calculations of modelgrain boundaries (GBs) in CuInSe 2 and CaGaSe 2 show that cation-terminated GBs have a valence-band offset with respect to the grain interior (GI). This offset repels holes from the GBs, thus depriving electrons there from recombination at the GB defects. Anion-terminated GBs have no such valence offset. CuGaSe 2 has, in addition, a conduction-band offset at the GB/GI interface, attracting electrons to the GBs. These features explain how polycrystalline chalcopyrite solar cells could outperform their crystalline counterparts.Keywords
This publication has 16 references indexed in Scilit:
- The impact of charged grain boundaries on thin-film solar cells and characterizationJournal of Applied Physics, 2005
- Direct observation of copper depletion and potential changes at copper indium gallium diselenide grain boundariesApplied Physics Letters, 2005
- How Polycrystalline Devices Can Outperform Single‐Crystal Ones: Thin Film CdTe/CdS Solar CellsAdvanced Materials, 2004
- Local built-in potential on grain boundary of Cu(In,Ga)Se2 thin filmsApplied Physics Letters, 2004
- Anomalous Grain Boundary Physics in Polycrystalline: The Existence of a Hole BarrierPhysical Review Letters, 2003
- Cathodoluminescence of Cu(In,Ga)Se2 thin films used in high-efficiency solar cellsApplied Physics Letters, 2003
- Direct evidence for grain-boundary depletion in polycrystalline CdTe from nanoscale-resolved measurementsApplied Physics Letters, 2003
- Defect-induced nonpolar-to-polar transition at the surface of chalcopyrite semiconductorsPhysical Review B, 2001
- Anion displacements and the band-gap anomaly in ternarychalcopyrite semiconductorsPhysical Review B, 1983
- The electrical properties of polycrystalline silicon filmsJournal of Applied Physics, 1975